Last Updated:
November 15, 2000

Recent Papers
 

Advanced Processing of Group III-Nitrides

Ferromagnetic Semiconductors Based Upon AlGaP

1.6A GaN Schottky Rectifiers on Bulk GaN Substrates

Charge Pumping in Sc2O3/GaN Gated MOS Diodes

Finite Difference Analysis of Thermal Characteristics of Continuous Wave Operation 850nm Lateral Current Injection and Implant-Apertured VCSEL with Flip-Chip Bond Design

Ferromagnetism in Cobalt-Implanted ZnO

Effect of Gate Length on DC Performance of AlGaN/GaN HEMTs Grown by MBE

Dilute Magnetic GaN, SiC and Related Semiconductors

Dry Etching of SiC

Room Temperature Ferromagnetism in GaMnN and GaMnP

Characterization of High Dose Fe Implantation into p-GaN

Magnetic and Structural Properties of Co, Cr, V Ion-Implanted GaN

Optical and Electrical Properties of GaMnN Films Grown by Molecular Beam Epitaxy

Magnetic Properties of n-GaMnN Thin Films

Magnetic Properties of p-Type GaMnP Grown by Molecular-Beam Epitaxy

Breakdown Voltage and Reverse Recovery Characteristics of Free-Standing GaN Schottky Rectifiers

Recent Advances in Gate Dielectric and Polarized Light Emission from GaN

Thermal Stability of Ion-Implanted Hydrogen in ZnO

Proton and Gamma-ray Irradiation Effects on InGaP/GaAs Heterojunction Bipolar Transistors

High Current Bulk GaN Schottky Rectifiers

Performance of AlGaN/GaN High Electron Mobility Transistors at Nanoscale Gate Lengths

High Power GaN Electronic Devices

HVPE-Grown AlGaN/GaN HEMTs

Hydrogen Incorporation, Diffusivity and Evolution in Bulk ZnO

SiO2/Gd2O3/GaN Metal Oxide Semiconductor Field Effect Transistors

Growth of Dilute Magnetic Semiconductor GaMnN by Molecular Beam Epitaxy

Design of Junction Termination Structures for GaN Schottky Power Rectifiers

Magnetic Properties of Mn- and Fe-Implanted p-GaN

Vertical and Lateral Mobilities in n-(Ga, Mn)N

Electrical Characteristization of GaN Metal Oxide Semiconductor Diodes Using MgO as the Gate Oxide

Nanoscale MRAM Elements

New Applications for GaN-based Semiconductors

New Directions in GaN-based Devices - High Voltage Rectifiers and Spin-Dependent Structures

Comparison of Ohmic Contact Properties on n-GaN/p-SiC and n-AlGaN/p-SiC Heterojunctions

Influence of MgO andSc2O3 Passivation on AlGaN/GaM High Electron Mobility Transitors

Proton Irradiation of MgO- or Sc2O3-Passivated AlGaN/GaN High Electron Mobility Transitors

Comparison of Surface Passivation Films for Reduction of Current Collapse in AlGaN/GaN High Electron Mobility Transistors

DC and RF Performance of Proton-Irradiated AlGaN/GaN High Electron Mobility Transistors

Pt Schottky Contacts to n-(Ga, Mn)N

Reversible Barrier Height Changes in Hydrogen-Sensitive Pd/GaN and Pt/GaN Diodes

Inversion Behavior in Sc2O3/GaN Gated Diodes

Magnetic Properties o Fe- and Mn-Implanted SiC

Stability of SiC Schottky Rectifiers to Rapid Thermal Annealing

Advances in Wide Bandgap Materials for Semiconductor Spintronics

GaN and Other Materials for Semiconductor Spintronics

Surface Passivation of AlGaN/GaN HEMTs Using MBE-Grown MgO or Sc2O3

Vertical and Lateral GaN Rectifiers on Free-Standing GaN Substrates

Wide Bandgap Ferromagnetic Semiconductors and Oxides

Hydrogen Incorporation and Diffusivity in Plasma-Exposed Bulk ZnO

Edge Termination Design and Simulation for Bulk GaN Rectifiers

Hydrogen-Sensitive GaN Schottky Diodes

Development of Advanced Plasma Process with an Optical Emission Spectroscopy-based Endpoint Technique for Etching of AlGaAs over GaAs in Manufacture of Heterojunction Bipolar Transistors

Processing Techniques for InGaAs/InAlAs/InGaAs Spin Field Effect Transistors

Ion Implantation into GaN

A Review of Dry Etching of GaN and Related Materials

Fabrication and Performance of GaN Electronic Devices

GaN/AlGaN HBT Fabrication

GaN PN Junction Issues and Developments

Temperature Dependent Performance of GaN Schottky Diode Rectifiers

Dry Etching of GaN and Related Materials-Comparison of Techniques

Comparison of Novel Chlorine, Bromine and Iodine Plasma Chemistries for Anisotropic Trench Etching in GaN, InN and A1N

Selective Dry Etching Of The GaN/InN/AlN, GaAs/AlGaAs and GaAs/InGaP Systems

Dry Etching To Form Submicron Features In Cmr Oxides: PrBaCaMnO3 and LaSrMnO3

Inductively Coupled Plasma Etching Of III-Nitrides In Cl2/Xe, Cl2/Ar and Cl2/He

Low Bias Dry Etchinf of SiC and SiCN in ICP NF3 Discharges

Photoelectrochemical Etching of InxGa1-xN

Plasma Etching of NiFeCo, NiMnSb and CoFeB-Based Multilayers

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